Application requirements
The main aim is to realise a subsystem to accurately dose boron and phosphor precursors to the silicon wafers. This subsystem needs to be compact in order to reduce the size of the machine, and needs to be ‘plug & play’ for convenience. In addition to these ‘hard’ requirements, a ‘soft’ requirement is that only one contact point - who speaks Tempress’ language - should take responsibility for the entire subsystem development.