When the sputter system observes that the thickness or transparency is deviating, it corrects the deposition process by adjusting the gas flows. Therefore, a very fast flow control is desired with a response in the 150-millisecond range.
The FLEXI-FLOW mass flow controller can do this. In case there are variations in inlet pressure, the gas flow controller keeps the flow at the setpoint as responsive as possible. When there are changes in the reactor chamber, the flow controller receives a new setpoint. This way, fast response to new setpoints results in less waste and less rejected products.