Stable & fast gas flow control for vacuum deposition

In vacuum deposition equipment mass flow controllers are used for the supply of gases. Bronkhorst newest flexible gas flow controller (FLEXI-FLOW) is an excellent choice for vacuum deposition processes by reactive sputtering, due to its fast response. It reaches setpoints within 150 milliseconds. The flow controller has a large dynamic flow range suitable to control gas flows from 0,5 ml_n/min up to 20 l_n/min, which largely accommodates for the requirements of reactive sputtering.

Reactive sputtering is a layer deposition technique where sputtered particles react with a gas that is introduced to the sputtering chamber. To this end, high-energy argon bombards a target, usually a plate of metal such as aluminium, releasing a vapour of sputtered metal particles. They react with the supplied reactive gases, typically oxygen or nitrogen, allowing very thin ceramic layers to be deposited on glass, silicon wafers, metal or polymer. Reactive sputtering is used for applying coatings for anti-reflection, hardening, anti-wear, anti-corrosion, etc. Mass flow controllers play a highly relevant role in the supply of gases.

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Process solution

The FLEXI-FLOW mass flow controller reaches 150 msec response time without overshoot. This way, we can meet the requirements of vacuum coating customers that need multi-channel flow solutions offering stable and fast flow control in combination with shut-off functionality.

Fast response flow control

End-users of vacuum deposition equipment require a very fast responding gas supply system. They optimise process conditions like pressure and gas flow and monitor the result by measuring the coating thickness during the coating process. During the process, there should be a stable, controlled gas flow to keep the coating of the correct thickness and composition.

Shut-off functionality

A shut-off valve can be integrated to minimise leakage to the vacuum chamber in the phase of vacuuming - especially useful in ultra-high vacuum reactors.

Large dynamic range

The large dynamic flow range with a high turndown ratio of at least 1:1000 reduces the number of models and spare parts needed and improves the flexibility of the vacuum deposition equipment.
 

Wide interface capability

Compact multi-channel solutions are available with interface of choice through a gateway, making use of industrial protocols like EtherCAT and Profinet. Data produced in this way can be used for predictive maintenance.

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