{"column":{"component":"Media","content":{"media":{"src":{"mobile":"/media/rmtn4gyc/wafer-foup-load-port.jpg?width=668&height=0&format=webp&v=1db73099425d990","tablet":"/media/rmtn4gyc/wafer-foup-load-port.jpg?width=1145&height=0&format=webp&v=1db73099425d990","desktop":"/media/rmtn4gyc/wafer-foup-load-port.jpg?width=1642&height=0&format=webp&v=1db73099425d990"},"alt":"Flow control in FOUP process","type":"image","link":{},"width":668,"height":0},"caption":""}}}
Semiconductor manufacturing relies on extremely clean environments to produce high-quality silicon wafers for applications such as telecom, gaming, and industrial electronics. During wafer handling and storage, contamination must be avoided to maintain high yields. FOUPs (Front Opening Universal Pods) are used to store wafers temporarily and transfer them between process steps. To protect wafers from moisture, particles, and oxygen—which can cause oxidation and reduce conductivity—FOUPs are purged with ultra-high purity (UHP) nitrogen or clean dry air. Precise control of this purge process is essential for consistent performance and cost efficiency.
Application requirements
FOUP systems, including Overhead Buffers (OHB) and Load Ports, play a critical role in wafer handling. Cleanliness during these steps directly impacts product yield. The purge process must minimize contaminants while ensuring stable and repeatable gas flow. Semiconductor equipment suppliers require accurate flow control solutions that fit within compact designs and meet stringent cleanliness standards.
Important topics
Important topics
Cost optimization
Compact design to reduce footprint
Controlled and traceable manufacturing processes
Accuracy and repeatability for consistent purge performance
Process solution
Bronkhorst mass flow controllers are used to monitor and control the purge flow of UHP nitrogen or clean dry air in FOUP systems. Older fabs typically use clean dry air, while newer fabs prefer UHP nitrogen for enhanced cleanliness. The controllers ensure precise and stable flow, which is essential for maintaining wafer integrity and preventing oxidation. By integrating these devices, semiconductor equipment suppliers can achieve reliable purge performance, optimize gas consumption, and maintain the stringent standards required in modern wafer fabrication.
“Bronkhorst gives us the precision we need for reliable FOUP purging.”
Recommended products
MASS-STREAM
In-line Mass Flow Meter/Controller for industrial gases
For 0.01 - 10000 ln/min
Accuracy ***
On board gas database
Low pressure drop
View range
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